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Multilayer coatings for optics in the extreme ultraviolet
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The strong absorption of materials in the extreme ultraviolet (EUV) above ~50 nm has precluded thedevelopment ofefficient coatings. The development of novel coatings with improved EUV performance is presented. An extensiveresearch was performed on the search and characterization of new materials with low absorption or high reflectance.Lanthanide series was found to be a source of materials with relatively low absorption in this range, where mostmaterials in nature present a strong absorption. Other materials, such as SiO and B, have been found to have interestingproperties for applications on EUV coatings. As a result, novel multilayers based on Yb, Al, and SiO have beendeveloped with narrowband performance in the 50–92 nm range. In some cases, the difficulty of developing narrowbandcoatings in the EUV can be overcome by designing multilayers that address specific purposes, such as maximizingand/or minimizing the reflectance at two or more wavelengths or bands. In this direction, we are working towards thedevelopment of coatings that combine a relatively high reflectance in a desired EUV band with a low reflectance inanother band, for applications in which the presence of the latter radiation may mask a weak EUV radiation source.Keywords: Multilayers, Extreme Ultraviolet, Far Ultraviolet, Mirrors, Filters, Reflection, Optical Constants, Spaceoptics
Publication year: 2011
Reference: Multilayer coatings for optics in the extreme ultraviolet
Juan I. Larruquert; Manuela Vidal-Dasilva; Sergio García-Cortésa; Luis Rodríguez-de Marcos; Mónica Fernández-Pereaa; José A. Aznárez; José A. Méndez
Proc. of SPIE Vol. 7995 79952S-1, 79952S-6
doi: 10.1117/12.888463
Magazine: Proceedings of SPIE. The international society for optical engineering
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