Scientific technical services
Optical characterization of materials
The service offers different techniques for the optical characterization of materials, including various optical microscopy modalities (transmission, reflection, fluorescence, interferential and phase contrast), spectrophotometry and measurements of specular and diffuse reflectance, spectroscopic ellipsometry, luminescence measurements and determination of half-lives. in the visible and near IR and characterization of waveguides also in the visible and near IR.
Recently, the service also has the possibility of analyzing the topography of the samples on a nanometric scale using an atomic force microscope (AFM).
Low Pressure Laboratory
This laboratory, integrated in the Department of Images, Vision and Optical Instrumentation, is dedicated to the development and application of devices and systems that work in vacuum conditions. Vacuum is defined as an environment whose absolute pressure is less than atmospheric pressure. In the Laboratory, the absolute pressure range is covered from 1E-8 Pa (1E-10 mbar) [ultra-high vacuum] up to 90 kPa (900 mbar) [low vacuum].
Photometry, Radiometry and Fiber Optics Laboratory
The Photometry, Radiometry and Fiber Optics Laboratory provides metrology services as established in its Quality System. This system is based on the UNE-EN ISO/IEC 17025 standard and is approved and supervised by the Technical Quality Committee (TC-Q) of EURAMET (European Association of National Metrology Institutes) and by the Joint Committee of Regional Metrological Organizations. and the BIPM (JCRB). The Laboratory provides calibration services in the area of Photometry, Radiometry and Fiber Optics and its range of services is broken down in the CSIC service catalogue.
Laser processing of materials
The service makes use of different types of continuous and pulsed lasers (up to the fs scale), in a wide range of wavelengths (IR-UV) for the processing of materials. The service includes different types of surface processing, from laser annealing to surface ablation for micromachining applications or thin film processing. In the case of ultrashort pulse laser sources, it is also possible to perform subsurface micropatterning of transparent materials by nonlinear absorption. The service has the necessary equipment to control the beam and its focus in the work area through micro-positioning systems or galvanometric deflectors. It also has the necessary equipment for the production of samples in thin sheet by deposit with pulsed excimer laser.
